Si基AAO模板法制备尖晶石型ZnAl_2O_4纳米结构  

Prepared Photocatalytic of Spinel-type ZnAl_2O_4 Using AAO as A Template on Si Substrate

作　　者：高波[1] 张海明[1] 朱彦君[1] 李芹[1] 李菁[1] 

机构地区：[1]天津工业大学理学院,天津300160

出　　处：《发光学报》2011年第12期1243-1246,共4页Chinese Journal of Luminescence

基　　金：天津市自然科学基金(09JCYBJC04400)资助项目

摘　　要：以Si基AAO为模板,以Zn和C粉作蒸发源,通过化学气相沉积法,在不同的温度下反应得到了不同的ZnAl2O4纳米结构。对样品的形貌和成分结构进行了分析。扫描电镜结果显示,在800℃获得的ZnAl2O4样品表面仍保留着AAO模板的孔洞结构。而XRD结果表明,在700,800,900℃下获得的样品都出现了ZnAl2 O4衍射峰,说明ZnAl2 O4已经成功制备。结合SEM图和XRD图可以看出,800℃是制备尖晶石型光催化ZnAl2O4纳米结构的最合适温度。ZnAl2O4 composite structure was fabricated using Zn and C powers by CVD method at different temperature.Structure and optical properties of the composite structure were investigated using scanning electron microscopy（SEM） and X-ray diffraction（XRD）.SEM results indicated that the sample of ZnAl2O4 structure prepared at 800 ℃ remained the regular pore structure of AAO template.The XRD patterns demonstrated that the diffraction peaks of the ZnAl2O4 appeared at the reaction temperature of 700,800,900 ℃.That indicated the ZnAl2O4 structures were obtained successfully.The optimum temperature for CVD method fabricated ZnAl2O4 nanostructure was 800 ℃ by the SEM and XRD results.

关 键 词：尖晶石ZnAl2O4 Si基AAO 化学气相沉积 

分 类 号：O643.36[理学—物理化学]