NiO靶烧结温度对NiO/Ni_(81)Fe_(19)双层膜的影响  

The Influence of Sintering Temperature in NiO Target on the Properties of Exchange Coupling NiO/Ni_(81) Fe_(19) Double Layered Films

作　　者：胡用时[1] 邱进军[1] 李佐宜[1] 刘兴阶[1] 

机构地区：[1]华中理工大学电子科学与技术系

出　　处：《华中理工大学学报》2000年第1期79-81,共3页Journal of Huazhong University of Science and Technology

基　　金：国家教育部部门开放研究实验室资助项目

摘　　要：在不同的温度下烧结制备 Ni O靶 ,用射频磁控溅射法淀积 Ni O/ Ni81 Fe1 9双层膜 ,研究了不同的温度烧结 Ni O靶对 Ni O/ Ni Fe双层膜特性的影响 ,结果表明 ,使用不同的烧结温度制备的 Ni O靶溅射所得的 Ni O膜中 Ni的化学价态及其含量不同 ,进而影响 Ni O/ Ni81 Fe1NiO targets were prepared by the use of sintered method at different sintering temperature. Double layered NiO/NiFe films were deposited with rf magnetron sputtering. The influences of sintering temperature of NiO targets on the properties of NiO single layered films and Double layered NiO/NiFe films were studied. The result showed that different sintering temperatures result in the different atom proportion of various chemical values of Ni in NiO film affecting the squareness of hysteresis loop and interlayer exchange coupling field in NiO/NiFe Double layered Films.

关 键 词：烧结温度 矫顽力 双层膜 氧化镍靶 射频磁控溅射 

分 类 号：O484.1[理学—固体物理] TM271[理学—物理]