空心阴极电子束对多弧离子镀TiAlN薄膜组织形貌及摩擦学性能的影响  

Impacts of Electron Beam on Growth and Tribological Property of TiAlN Films Deposited by Multi-Arc Ion Plating

作　　者：吴化[1] 宋力[1] 李雪松[1] 杨悦[1] 

机构地区：[1]长春工业大学先进结构材料教育部重点实验室,长春130012

出　　处：《真空科学与技术学报》2012年第1期19-24,共6页Chinese Journal of Vacuum Science and Technology

摘　　要：采用空心阴极电子束辅助多弧离子镀的方式在WC基体上制备了TiAlN薄膜,讨论了电子束能量的大小对膜层组织形貌及摩擦学性能的影响。利用X射线衍射仪、扫描电子显微镜、表面轮廓测试仪及材料表面微纳米力学测试系统对薄膜的相组成、微观结构、三维形貌及摩擦学性能进行了检测和分析。结果表明:在未施加空心阴极电子束作用时薄膜具有明显的(112)择优取向,随着空心阴极电流的提高,薄膜逐渐朝着多晶面生长,择优取向减弱。电子束对膜层的形貌及摩擦学性能有显著影响,随着电子束能量的提高,膜层逐渐变得致密、平整,表面粗糙度和摩擦系数均降低,抗磨损性能提高。The TiAlN films were deposited on WC substrates by multi-arc ion plating assisted by hollow cathode（HCD） electron beam.The impacts of electron beam power on the film growth and mechanical properties were evaluated.The microstructures of the TiAlN films were characterized with X-ray diffraction,scanning electron microscopy,and conventional mechanical probes.The results show that the HCD electron beam significantly affects the microstructures and tribological property of the TiAlN films.As the electron beam energy increased,the growth of the（112）preferentially oriented grain was gradually turned into a growth of polycrystalline grain,and the films looks smoother and more compact with a decreased surface roughness,a reduced friction coefficient and an increased wear resistance.

关 键 词：空心阴极 TIALN薄膜 电子束 离化率 

分 类 号：TG148[一般工业技术—材料科学与工程]