超临界抗溶剂制粒装置的现状及其展望  

Present status and prospect of granulation device by using supercritical anti-solvent

作　　者：巫先坤[1] 王志祥[1] 黄德春[1] 蔡锦源[1] 颜庭轩[1] 

机构地区：[1]中国药科大学药学院,江苏南京210009

出　　处：《化工进展》2012年第3期489-494,501,共7页Chemical Industry and Engineering Progress

摘　　要：超临界抗溶剂法是一种新型超细微粒制备技术,现已在许多领域得到广泛应用。本文简要陈述了超临界抗溶剂技术的基本原理、装置组成和操作方式,详细阐述了超临界抗溶剂装置喷嘴部件的演进,从该角度介绍了GAS制粒装置、ASES制粒装置、SEDS制粒装置和SAA制粒装置的发展和优化历程,并对超临界抗溶剂制粒装置的多功能化、喷嘴的进一步优化、结晶釜的可视化等提出展望。As a new micro-particle granulation technology,supercritical anti-solvent has been widely used in many fields.The fundamental principles,apparatus compositions and operation modes of supercritical anti-solvent technology were introduced briefly.The development and optimization process of granulation device of gas anti-solvent（GAS）,aerosol solvent extraction system（ASES）,solution enhanced dispersion by supercritical fluids（SDES）and supercritical fluid anti-solvent-atomization（SAA）were analyzed from the evolution of the nozzle components of this apparatus.Meanwhile,the prospect in device developing,such as multi-function of the device,further optimization of the nozzle and the crystallization vessel visualization were addressed.

关 键 词：超临界抗溶剂法 GAS制粒装置 ASES制粒装置 SEDS制粒装置 SAA制粒装置 

分 类 号：TQ050.3[化学工程]