TiZrV吸气剂薄膜吸气性能的研究  

Development and Characterization of TiZrV Getter Films

作　　者：张波[1] 尉伟[1] 范乐[1] 王建平[1] 裴香涛[1] 洪远志[1] 张玉方[1] 李为民[1] 王勇[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,合肥230029

出　　处：《真空科学与技术学报》2012年第2期114-117,共4页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金资助项目(No.10675119)

摘　　要：TiZrV合金在180℃下加热24 h即可激活,是迄今发现的激活温度最低的非蒸散型吸气剂,已在粒子加速器领域得到应用。采用直流磁控溅射法在不锈钢管道内壁获得了TiZrV薄膜,并研究了薄膜对CO和H2的吸气性能。在200℃下加热24 h后TiZrV对CO和H2的抽速分别为0.23和0.02 L.s-1.cm-2,吸气容量分别为6.8×10-5和6.6×10-2Pa.L.cm-2,且随着激活温度和时间的增加,吸气性能会有所提高。The TiZrV films,as a non-evaporable getter（NEG） material,were deposited on the inner walls of stainless tube by DC magnetron sputtering.The impacts of the deposition and activation conditions on the gas absorption characteristics of the TiZrV films were evaluated.The tests with CO and H2 gases were conducted after the setup was baked at 200℃ for 24 h.The results show that the TiZrV films works well as a NEG material.It has a pumping speed of 0.23 L·s-1·cm-2 and an absorption capacity of 6.8×10-5 Pa·L·cm-2 for CO,and the counter parts for H2 are 0.02 L·s-1·cm-2 and 6.6×10-2 Pa·L·cm-2,respectively.We found that the gettering performance improves,as the activation temperature rises up and lasts for a longer time.

关 键 词：TiZrV薄膜 非蒸散型吸气剂 吸气性能 粒子加速器 

分 类 号：TB741[一般工业技术—材料科学与工程] TL503.7[一般工业技术—真空技术]