脉冲激光沉积动力学研究进展  

The dynamics of pulsed laser deposition technology

作　　者：何敏华[1,2] 张端明[2] 

机构地区：[1]武汉工程大学理学院,武汉430073 [2]华中科技大学物理学院,武汉430074

出　　处：《物理》2012年第3期141-150,共10页Physics

基　　金：国家自然科学基金(批准号:50872038;50972040;10604017;10675048;51102103)资助项目

摘　　要：脉冲激光沉积技术是现代常用的先进薄膜材料制备技术之一.文章在简要介绍脉冲激光沉积技术及其进展的基础上,较全面地介绍了脉冲激光沉积动力学的基本物理图像和动力学构架,深入地探讨了激光烧蚀靶材过程、等离子体膨胀过程和薄膜沉积过程的动力学规律,阐述了我国学者在脉冲激光沉积动力学研究方面的贡献,例如包括脉冲激光沉积三个工艺过程自洽的统一模型,等离子体膨胀的冲击波模型,基于局域能量动量守恒定律的新等离子体演化动力学模型,包括热源项、蒸发项、等离子体屏蔽效应和动态物性参数的烧蚀热传导模型,考虑电子碰撞效应和能带结构变化的修正双温模型,能统一描写从纳秒级到飞秒级脉冲激光烧蚀规律的统一双温模型等.Pulsed laser deposition （PLD） is a modern method to prepare many kinds of functional materials. The process can be divided into three stages： laser ablation,plasma expansion,and film growth. There are many complex phenomena in these processes, and we shall briefly describe the current research on the mechanism of PLD. The dynamics of the basic physical processes of the three stages will be explored in detail, with particular emphasis on the work in China. We introduce various models such as the self consistent unified model covering all three PLD processes, the shock wave plasma expansion modal, a new plasma evolution dynamics model based on local energy-momentum conservation, the ablative heat conduction model which includes terms taking into account the heat source, evaporation, plasma shielding, and dynamic physical parameters, and a unified thermal model suitable for higher energy fields which takes into account electron-electron collisions and the density of states effect, and can explain thermophysical effects with pulse widths ranging from nanoseconds to femtoseconds.

关 键 词：脉冲激光沉积 脉冲激光烧蚀 等离子体膨胀 薄膜生长 

分 类 号：TN249[电子电信—物理电子学] TN304.055