氮离子注入钨的微观分析  

Microanalyses of N^+ Implanted Tungsten

作　　者：汪德志[1] 陈剑宣[1] 郑振华 张海龙[1] 黄宁康[1] 

机构地区：[1]四川大学原子核科学技术研究所教育部辐射物理及技术重点实验室,成都610064 [2]中国核动力设计研究院,成都610041

出　　处：《真空科学与技术》2000年第2期120-122,共3页Vacuum Science and Technology

摘　　要：对不同剂量N+ 离子注入钨的试样进行了XRD及XPS微观分析 ,研究注入层的元素、成分、化学态以及有关的相结构。结果表明 ,注入层除了单质W外 ,还有氧化物WO3 ,氮 氧 钨的化合物 ,如Wx(N ,O)以及氮化物δ WN ,随着氮离子注入剂量的增加 ,Wx(N ,O)减少 ,而δ WN量增加 ,污染物WO3 也相应减少。文中对有关机理作了相应的探讨。Samples of the N + implanted tungsten were analysed with X ray diffraction and X ray photoelectron spectroscopy to understand the composition and their chemical states in the implanted layer,as well as related phase formation due to ion implantation.The results show that apart from α W,there existed WO 3,W x (N,O) and δ WN.With increasing doses of N +implantation,the content of δ WN was increased,while that of WO 3 was decreased,and that of W x (N,O) was also decreased.Related phase transformation and its mechanism were discussed in this paper.

关 键 词：离子注入 钨 相结构 金属表面改性 氮离子 

分 类 号：TG146.411[一般工业技术—材料科学与工程] TG174.442[金属学及工艺—金属材料]