衬底温度对氧化钛薄膜的光学常数影响  

Substrate Temperature Effect on Optical Constants of TiO_x Thin Film

作　　者：李林[1] 吴志明[1] 居勇峰[1] 蒋亚东[1] 

机构地区：[1]电子科技大学光电信息学院,电子薄膜与集成器件国家重点实验室,成都610054

出　　处：《电子器件》2012年第1期7-10,共4页Chinese Journal of Electron Devices

基　　金：国家自然科学基金项目(60736005)

摘　　要：采用沈阳CK-3高真空磁控溅射薄膜沉积设备在K9玻璃衬底上分别制备了衬底温度为150℃、200℃和250℃的氧化钛薄膜。XRD分析显示这三种温度制备的薄膜由于制备温度不高均没有明显衍射峰,为非晶薄膜。薄膜的光学常数由德国SENTECH SE 850型光谱型椭偏仪对薄膜测试得到,测试波长为300 nm～800 nm,采用Cauchy模型对测试结果进行拟合。结果发现随着制备衬底温度的增大,薄膜的折射率n和消光系数k都随着增大。在衬底温度从150℃增大到250℃时,薄膜的光学带隙从3.46 eV减小到3.02 eV。TiOx thin films were obtained on K9 glass substrates by CK-3 magnetron sputtering system, the deposited temperatures are 150℃ ,200℃and 250℃ respectively. The as-deposited films have no obvious diffraction peaks to be observed and exhibit an amorphous structure from X-ray diffraction （XRD）patterns. TiOx thin films＇ optical constants were measured by SENTECH SE 850 Spectral Type Ellipsome ter within the spectral region 300 nm - 800 nm. The ellipsometer＇s experiment data were fitted for Cauchy model. It is found that refractive index （n）and extinction coefficient （k） increase while the substrate temperature increases. When the substrate temperature is increased from 150 ℃to 250 ℃,the value of Eg decreased from 3.20 eV to 3.12 eV.

关 键 词：氧化钛薄膜 XRD 椭偏仪 光学常数 光学带隙 

分 类 号：TN305.92[电子电信—物理电子学]