CMP系统真空供给系统设计  

The Design of Vacuum Supply Pump for the CMP System

作　　者：李伟 高文泉 柳滨 陈波 

机构地区：[1]北京中电科电子装备有限公司,北京100176

出　　处：《电子工业专用设备》2012年第3期45-49,共5页Equipment for Electronic Products Manufacturing

基　　金：国家02重大专项(2009ZX02011-005A)

摘　　要：研制了一套化学机械抛光机(CMP)专用的真空供给系统,主要由水环式真空泵、真空泵箱体、真空储气罐和水箱(汽水分离器)组成及控制模块组成。设计了水箱供水控制模块、水箱温度自动控制模块,通过控制水箱水温进而控制真空泵工作液的温度,保证真空度要求,同时也达到节约用水、降低能耗的要求。采用有限元分析软件ANSYS Workbench对真空供给系统机架进行了模态分析,研究机架的振型、固有频率,从而在结构设计上避免共振。Developed a special vacuum supply system used for chemical mechanical polishing, including liquid ring vacuum pump, vacuum pump chamber, vacuum storage tank, and water tank （steam/gas-water separator） and some control modules. Design the water tank supply control module, the automatic temperature control module, control vacuum pump working liquid temperature by means of the control water tank water temperature, ensure the vacuum degree requirements, but also to save water, reduce the energy consumption demand. With dynamical modal analysis of vacuum pump chamber rack by use of the finite element analysis software ANSYS Workbench, we can get the inherent frequency and vibration model, which can avoid sympathetic vibration.

关 键 词：化学机械抛光 真空供给系统 温度自动控制 ANSYS WORKBENCH 模态分析 

分 类 号：TN948.43[电子电信—信号与信息处理]