双层辉光离子渗金属技术沉积氮化钛薄膜的微观结构研究  

Microstruture of Titanium Nitride Films Prepared by Double-Glow Discharge Plasma Surface Alloying Technique

作　　者：陈首部[1] 韦世良[1] 何翔[1] 孙奉娄[1] 

机构地区：[1]中南民族大学电子信息工程学院,武汉430074

出　　处：《中南民族大学学报（自然科学版）》2012年第1期66-70,共5页Journal of South-Central University for Nationalities：Natural Science Edition

基　　金：湖北省自然科学基金资助项目(2011CDB418);中南民族大学学术团队基金资助项目(XTZ09003);中央高校基本科研业务费专项资金资助项目(CZZ11001)

摘　　要：采用双层辉光离子渗金属技术,在硬质合金基体表面上制备了氮化钛(TiN)薄膜,通过微观结构和显微硬度分析,研究了基体温度对TiN薄膜性能的影响.实验结果表明:所有TiN样品均具有面心立方结构,并且薄膜生长的择优取向、晶粒尺寸、晶面间距、晶格常数和微观硬度等都与基体温度密切相关.当基体温度为650～780℃时,TiN薄膜具有最小的晶粒尺寸(26.9 nm)和最大的显微硬度(2204 HV).Titanium nitride（TiN） films were directly deposited on the surface of hard alloy tools（YG8） using the double-glow discharge plasma surface alloying technique.The influence of substrate temperature on the microstructural and mechanical properties of TiN films was investigated by X-ray diffraction（XRD） and microhardness test.Experimental results demonstrate that the prepared TiN films are all the face-centered cubic（fcc） structure,and that the substrate temperature significantly affects the preferred orientation,crystallite size,plane spacing,lattice constant and microhardness of the films.The TiN film deposited at substrate temperature of 650~780 ℃ has the maximum microhardness of 2204 HV and the minimum crystallite size of 26.9 nm.

关 键 词：双层辉光离子渗金属技术 氮化钛薄膜 微观结构 

分 类 号：TG156.8[金属学及工艺—热处理]