磁控溅射MoO_3半导体功能薄膜的制备与结构性能研究  

Structure and Properties of MoO_3 Functional Thin Films Prepared by RF Magnetron Sputtering

作　　者：刘云辉[1] 王波[1] 

机构地区：[1]北京工业大学材料科学与工程学院薄膜材料与技术实验室,北京100124

出　　处：《材料导报》2012年第8期60-63,共4页Materials Reports

基　　金：北京市自然科学基金(2062004)

摘　　要：采用射频磁控溅射技术分别在Si(100)和玻璃衬底上通过调整不同的溅射功率和退火温度成功制备了MoO3薄膜。利用X射线衍射、扫描电镜、紫外可见光分光光度计、接触角测量等进行了表征和分析。X射线衍射表明400℃以上沉积的MoO3结晶薄膜属正交晶系,沿(0k0)(k=2n)取向择优生长,衍射峰强度和薄膜的结晶度随溅射功率的提高逐渐增强;利用扫描电镜观察表面形貌,发现结晶的薄膜表面发生了不同程度的变化,由初期均匀分布的纳米细长状颗粒长大成二维片状结构;紫外可见光分光光度计测试表明,薄膜在可见光区具有良好的光学透过性,平均透过率达60%以上;接触角测量发现薄膜呈明显亲水性,通过后续的表面氟化改性热处理,实现了薄膜亲水-疏水的润湿性能转换。MoO3 thin films were successfully prepared by RF magnetron sputtering on Si（100） and glass substrates, respectively, with different powers and annealed temperatures. The results of thin films were characterized with X-ray diffraction（XRD）, scanning electron microscopy（SEM）, ultraviolet-visible spectroscopy（UV-Vis）, contact angle measurement. X-ray diffraction studies revealed that crystalline films prepared under different sputtering power showed the presence of （0k0） preferential orientation indicated the structure of s-phase MoO3, and diffraction peak and crystallinity were gradually strengthened with the increasing sputter power. Original nano-club shape parti- cles dispersed on MoO3 films surface and then gradually grew up to lamellar structures. Transmittance of the films tested by UV-Vis, was favorable, average transmittance was over 60 %. Hydrophilicity of films were demonstrated via CAM, and after modification of low surface energy matter and thermal treatment, wettability conversion from hydro- philicity to hydrophobicity was realized.

关 键 词：MoO3薄膜 射频磁控溅射 微结构 接触角 

分 类 号：TB43[一般工业技术] TN305[电子电信—物理电子学]