溅射压力对Ni纳米颗粒形貌控制的影响  

Effects of sputtering pressure on the morphologies of Ni nanoparticles

作　　者：崔海蓉[1] 

机构地区：[1]宁波工程学院机械学院,浙江宁波315016

出　　处：《兵器材料科学与工程》2012年第3期19-22,共4页Ordnance Material Science and Engineering

基　　金：宁波市自然科学基金(No.2011A610132);宁波工程学院博士科研启动基金(No.0080011540026)

摘　　要：采用磁控溅射方法制备Ni纳米颗粒,使用扫描电镜（SEM）、原子力显微镜（AFM）等表征其形貌结构。采用高压溅射喷嘴结构,研究改变溅射压力等工艺参数对Ni纳米颗粒尺寸与形貌的影响。实验表明,采用高压喷嘴结构,溅射压力为20~180 Pa之间可以获得尺寸为10~100 nm的Ni纳米颗粒。采用高压溅射喷嘴结构可以得到具有晶体结构特征的Ni纳米颗粒。Ni nanoparticles were prepared by DC magnetron sputtering technique.The structural properties were characterized by means of scanning electron microscopy（SEM） and atomic force microscopy（AFM） respectively.The effect of sputtering pressure on the size and morphology of the sputtered Ni nanoparticles was studied using a sputtering configuration with high-pressure ejection nozzle.The results show that Ni nanoparticles with size from 10 nanometers to 100 nanometers can be obtained by DC magnetic sputtering with Ar pressure from 20 Pa to 180 Pa.The sputtering configuration with high-pressure ejection nozzle contributes to prepare the Ni nanoparticles with crystal structure characteristics.

关 键 词：Ni纳米颗粒 磁控溅射 溅射压力 颗粒形貌 

分 类 号：TB34[一般工业技术—材料科学与工程]