用于平面靶X射线诊断的1维KBA显微镜  

One-dimensional KBA microscope for planar target diagnosis

作　　者：伊圣振[1,2] 穆宝忠[1,2] 王新[1,2] 蒋励[1,2] 朱京涛[1,2] 王占山[1,2] 方智恒[3] 王伟[3] 傅思祖[3] 

机构地区：[1]同济大学教育部先进微结构材料重点实验室,上海200092 [2]同济大学精密光学工程技术研究所,上海200092 [3]中国工程物理研究院上海激光等离子体研究所,上海201800

出　　处：《强激光与粒子束》2012年第5期1076-1080,共5页High Power Laser and Particle Beams

基　　金：国家自然科学基金科学仪器专项(11027507);国家自然科学基金项目(10825521);上海市青年科技启明星计划项目(10QA1406900);教育部新世纪优秀人才支持计划项目(NCET-10-0631);上海市科学技术委员会优秀学科带头人计划项目(09XD1404000)

摘　　要：对用于神光Ⅱ装置4.75keV能点平面靶成像诊断的1维KBA显微镜进行了实验研究。基于空间分辨力和工作环境要求,设计了1维KBA显微镜的光学结构,并与传统KB显微镜的成像性能进行了对比分析。设计和制备了可同时工作于8keV和4.75keV能点的双能点多层膜KBA物镜,解决了系统装调问题。利用神光Ⅱ装置第九路激光打击Ti靶产生的X射线作为背光源照射1 500目金网,进行了4.75keV网格成像实验,结果表明:在整个背光源照明区域内,系统的实际分辨力约为4μm,系统的有效视场受背光源大小的限制。A one-dimensional KBA microscope for diagnosis of planar targets,working at 4.75 keV,has been experimentally studied.According to the requirements of spatial resolution and working environments,the optical structure of one-dimensional KBA microscope was designed,and compared with conventional Kirkpatrick-Baez microscope.A double-periodic multilayer KBA mirror simultaneously working at 8 keV and 4.75 keV was adopted and manufactured to complete the system alignment.The 4.75 keV X-ray imaging experiment in XRL chamber of Shenguang Ⅱ shows that the resolution is about 4 μm in all the illumination area of backlighter,and the effective field of the one-dimensional KBA microscope is limited by backlighter size.

关 键 词：瑞利-泰勒不稳定性 X射线诊断 KBA显微镜 KB显微镜 平面靶 

分 类 号：O434.1[机械工程—光学工程]