衬底对直流磁控溅射制备TiO_2薄膜结构和形貌的影响  

Influence of the substrate on structure and morphology of TiO_2 film deposited by DC magnetron sputtering

作　　者：徐开松[1] 何晓雄[1] 潘训刚[1] 

机构地区：[1]合肥工业大学电子科学与应用物理学院,安徽合肥230009

出　　处：《合肥工业大学学报（自然科学版）》2012年第5期640-643,共4页Journal of Hefei University of Technology：Natural Science

基　　金：安徽省自然科学基金资助项目(11040606M63);安徽省教育厅产学研重点资助项目(KJ2009A091)

摘　　要：在气压为1Pa和2Pa的情况下,文章采用直流磁控溅射法分别在Si(100)、Al2O3陶瓷、普通载玻片3种衬底上生长TiO2薄膜;利用原子力显微镜对TiO2薄膜的表面形貌进行观察,研究了压强及衬底对薄膜表面形貌的影响。并研究表明,在Si(100)衬底上生长的TiO2薄膜,气压为2Pa时比1Pa时表面粗糙度要大;在相同溅射气压下,Si(100)衬底上得到的TiO2薄膜质量明显优于Al2O3陶瓷和普通载玻片衬底上的。TiO2 thin films were deposited on Si（100）,Al2O3 ceramics and ordinary glass slide substrate respectively by using the reactive direct current magnetron sputtering method under deposition pressure of 1 Pa or 2 Pa.The influence of pressure and substrate on the surface morphology of TiO2 thin film was studied by atomic force microscope.The experimental results indicate that the surface roughness of TiO2 thin film on Si（100） substrate increases with the increase of the deposition pressure from 1 Pa to 2 Pa.The quality of TiO2 thin film on Si（100） substrate is superior to that on the Al2O3 ceramics and ordinary glass slide substrate under the same sputtering pressure（2 Pa）.

关 键 词：TIO2薄膜 磁控溅射 表面形貌 

分 类 号：TN305.8[电子电信—物理电子学]