纳米尺度标准样片光学表征方法的研究  

Research of the Optical Characterization Method on the Nano Dimension Standard Sample

作　　者：李源[1] 雷李华[1] 高婧[1] 傅云霞[1] 蔡潇雨[1] 吴俊杰[1] 

机构地区：[1]上海市计量测试技术研究院,上海201203

出　　处：《微纳电子技术》2012年第6期406-412,共7页Micronanoelectronic Technology

基　　金：国家质检总局公益性项目(201110051);上海市科委纳米专项(11nm0560800)

摘　　要：重点研究了纳米尺度标准样片的光学表征方法。采用基于纳米测量机(NMM)的激光聚焦传感器(LFS)和扫描白光干涉传感器(SWLIS)分别对平面尺度的标准样片和台阶标准样片进行了测量、分析与比较。实验结果表明,利用该纳米测量机LFS对标定值为3μm的TGZ1一维栅格样片进行测量,其扩展不确定度为4.2 nm,实现了精确表征。利用SWLIS测量方法对标定值为49.217μm的SHS8-50.0高台阶标准样板进行测量,测量不确定度分析结果为0.065 7μm,实现了采用光学检测技术跨尺度对纳米尺度精密器件和结构进行表征。扩大了基于纳米测量机光学表征方法的应用范围,有利于纳米几何量量值溯源体系的建立。The optical characterization method of the nano dimension standard sample was researched.The plane dimension standard sample and high step standard sample were measured,analysed and compared respectively through the laser focus sensor（LFS） and scanning white light interference sensor（SWLIS） based on the nano-measuring machine（NMM）.The experimental result indicates that the expanded uncertainty of TGZ1 one dimension grading sample with 3 μm calibration value with the LFS of the NMM is 4.2 nm,which obtains precise characterization.The SHS8-50.0 high step standard sample with 49.217 μm calibration value was measured with the SWLIS measurement method,and the measured uncertainty was 0.065 7 μm.The cha-racterization of the nano dimension precision device and structure was achieved by scale-span optical inspection technologies.The application scope of the optical characterization method based on the NMM is expanded and it is good for the build of the nano geometrical traceability system.

关 键 词：纳米尺度标准样片 光学表征方法 跨尺度 镀膜技术 表面粗糙度 

分 类 号：TH711[机械工程—测试计量技术及仪器]