微/纳米CVD金刚石涂层的制备  

Synthesis of Micro/Nano-crystalline CVD Diamond Films

作　　者：张旭辉[1] 左敦稳[1] 徐锋[1] 庆振华[1] 黄美健[1] 郑琳[1] 

机构地区：[1]南京航空航天大学抗疲劳制造与表面工程研究所,江苏南京210016

出　　处：《机械制造与自动化》2012年第3期34-36,48,共4页Machine Building & Automation

基　　金：国家自然科学基金(N0.51005117);南京航空航天大学2010年度研究生创新基金

摘　　要：使用热丝化学气相沉积(HFCVD)装置,在以WC-CO硬质合金为衬底,采用调节涂层生长参数,制备出性能优良的微/纳米金刚石涂层。用SEM,AFM,Raman表征微观结构和表面品质。采用压痕法评估涂层的结合性能,并与微米金刚石涂层、纳米金刚石涂层进行比较。结果显示,当生长气压由3.3 kPa降为1.0 kPa时,底层的微米级晶粒逐渐被上层纳米级晶粒覆盖,并且涂层表面显露出纳米金刚石涂层特性。在结合性能实验中也指出,微/纳米金刚石涂层的结合性能比纳米金刚石涂层要优异。High performance micro/nano-crystalline diamond films are deposited on Co-cemented carbide substrates using hot fila- ment chemical vapor deposition （HFCVD） technique and controlling deposition parameters. The surface morphology and microstruc- ture of the micro/nano-crystalline diamond films are analyzed by using SEM, AFM and Raman spectrometry. Adhesion performance of micro/nano-crystalUne diamond films is evaluated by indentation method, and the performance of micro-crystalline diamond films is compared with that of nano-crystalline diamond films. The results show that the bottom of the diamond films is gradually covered by nano-crystalline diamond, and the surface quality of micro/nano-crystalline diamond films is similar to that of the nano-crystalline dia- mond films when the reaction pressure drops from 3.3 kPa to 1.0 kPa. Adhesion performance of micro/nano-crystalline diamond films is better than that of nano-crystalline diamond films.

关 键 词：热丝化学气相沉积 金刚石涂层 表面粗糙度 

分 类 号：TG17[金属学及工艺—金属表面处理]