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机构地区:[1]Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices,Xidian University
出 处:《Chinese Physics B》2012年第7期455-459,共5页中国物理B(英文版)
基 金:Project supported by the National Key Science & Technology Special Project of China (Grant No. 2008ZX01002-002);the Major Program and State Key Program of National Natural Science Foundation of China (Grant No. 60890191)
摘 要:An A1GaN/GaN superlattice grown on the top of a GaN buffer induces the broadening of the full width at half maximum of (102) and (002) X-ray diffraction rocking curves. With an increase in the Si-doped concentration in the GaN wells, the full width at half maximum of the (102) rocking curves decreases, while that of the (002) rocking curves increases. A significant increase of the full width at the half maximum of the (002) rocking curves when the doping concentration reaches 2.5 × 10^19 cm-3 indicates the substantial increase of the inclined threading dislocation. High level doping in the A1GaN/GaN superlattice can greatly reduce the biaxial stress and optimize the surface roughness of the structures grown on the top of it.An A1GaN/GaN superlattice grown on the top of a GaN buffer induces the broadening of the full width at half maximum of (102) and (002) X-ray diffraction rocking curves. With an increase in the Si-doped concentration in the GaN wells, the full width at half maximum of the (102) rocking curves decreases, while that of the (002) rocking curves increases. A significant increase of the full width at the half maximum of the (002) rocking curves when the doping concentration reaches 2.5 × 10^19 cm-3 indicates the substantial increase of the inclined threading dislocation. High level doping in the A1GaN/GaN superlattice can greatly reduce the biaxial stress and optimize the surface roughness of the structures grown on the top of it.
关 键 词:A1GAN/GAN SUPERLATTICE Si doping
分 类 号:TN304.2[电子电信—物理电子学]
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