光学元件超声清洗工艺研究  

Optimization of ultrasonic cleaning of optics

作　　者：王刚[1] 马平[1] 邱服民[1] 胡江川[1] 鄢定尧[1] 

机构地区：[1]成都精密光学工程研究中心,成都610041

出　　处：《强激光与粒子束》2012年第7期1761-1764,共4页High Power Laser and Particle Beams

基　　金：国家高技术发展计划项目

摘　　要：系统开展了光学元件超声清洗工艺的实验研究。通过研究超声清洗剂、清洗温度等工艺参数的优化,找到了能够有效祛除元件表面无机污染物和有机污染物的较佳超声清洗工艺,且超声清洗没有对光学元件表面产生损伤,清洗后的光学元件接触角小于6°,并不残留大于1μm的颗粒,超声清洗对光学元件表面污染物的祛除能力远胜于手工清洗。An experimental study on ultrasonic cleaning of optics was carried out. Optimization of the cleaning process was performed through comparative experiments with different cleaning reagents and temperatures. The optimized cleaning process removes both organic pollutants and inorganic pollutants effectively. After optimized cleaning, the optics surface shows no additional damage, with the contact angle less than 6°, and no pollutant particles larger than 1 μm left. Ultrasonic cleaning attains a better cleaning effect than manual cleaning.

关 键 词：超声清洗 接触角 粗糙度 原子力显微镜形貌 表面微观状况 

分 类 号：TG356.28[金属学及工艺—金属压力加工]