用X射线衍射仪测试PtSi膜  

Measurement of PtSi Films by X-ray Diffractometer

作　　者：杨晓波[1] 罗江财[1] 

机构地区：[1]重庆光电技术研究所,重庆400060

出　　处：《半导体光电》2000年第A03期87-88,共2页Semiconductor Optoelectronics

摘　　要：PhilipsMRD3710X射线衍射仪由于其灵敏度高、可靠性好、操作方便 ,常常用于薄膜测试分析。采用X射线衍射仪对在 (10 0 )Si表面溅射Pt,并通过退火处理形成的Pt和Si的化合物进行了测试分析 ,从而对PtSi膜的研制提供了可靠的数据。Philips MRD X-ray diffractometer used in our experiment has very high sensitivity,reliability and resolution.Measurement and analysis are made using MRD diffractometer on Pt sputtered on Si(100)surface,and Pt and Si compounds formed after annealing.Measurement results of PtSi flims by MRD are given.

关 键 词：X射线衍射仪 PTSI 薄膜 测试 

分 类 号：TN304.055[电子电信—物理电子学] TN304.07