全息曝光系统轴向调节误差对光栅衍射波像差的影响  

Wavefront Aberration Analysis of the Interference Image According to Different Axis Alignment Errors in the Grating Exposure System

作　　者：韩建[1,2,3] 巴音贺希格[1] 李文昊[1] 孔鹏[1,3] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,吉林长春130033 [2]中国科学院南京天文光学技术研究所,江苏南京210042 [3]中国科学院研究生院,北京100049

出　　处：《光学学报》2012年第7期58-65,共8页Acta Optica Sinica

基　　金：国家自然科学基金(60478034);国家创新方法工作专项项目(2008IM040700);国家重大科学仪器设备开发专项(2011YQ120023);中国科学院知识创新项目(100132H100)资助课题

摘　　要：光栅衍射波像差作为全息光栅重要的技术指标之一,直接影响光栅分辨率,其中曝光光学系统的调节误差是引起光栅衍射波像差的主要因素。采用q参数讨论了高斯光束在光栅曝光光学系统中的传播和变换,通过计算高斯光束经准直系统后的相位给出了叠栅条纹相位分布的解析表达式,由此系统分析了曝光系统调节误差与光栅衍射波像差的关系。理论分析结果表明:左右曝光光路准直系统的相对离焦对光栅衍射波像差的影响最为显著;相对离焦量相同时,光栅衍射波像差随曝光系统焦距的减小而逐渐增大;理论模拟的条纹分布与实验中获得的叠栅条纹能够很好吻合。As one of the important technical specifications of holographic gratings, the diffraction wavefront aberration directly influences the grating resolution, which depends on the light path adjustment. The q-parameters of Gaussian beam are used to describe the propagation and the transformation by the collimating system of the exposal system; the spatial phase of the two Gaussian beams and the mathematical expression of Moirfi pattern are given; then the relation between the system adjustment error and the wavefront aberration of the resulting interference image is discussed. The conclusion shows that the relative defocus of the left and the right collimating systems is the most critical parameter in exposal system, which influences the wavefront aberration strongly. The wavefront aberration also increases according to the decreased focal length. The results obtained from the initial set of experiments are in good agreement with the theoretical analysis.

关 键 词：衍射 叠栅条纹 光栅波像差 相对离焦 

分 类 号：O433.4[机械工程—光学工程]