真空蒸镀红荧烯薄膜及其形貌分析  

Deposition and Characterization of Vacuum Evaporated Rubrene Films

作　　者：邓金祥[1] 康成龙[1] 杨冰[1] 满超[1] 崔敏[1] 孔乐[1] 杨萍[1] 

机构地区：[1]北京工业大学应用数理学院,北京100124

出　　处：《真空科学与技术学报》2012年第8期678-681,共4页Chinese Journal of Vacuum Science and Technology

基　　金：北京市自然科学基金(批准号4102014);北京市人才强教深化计划资助项目

摘　　要：红荧烯(rubrene)即5,6,11,12-四苯基并四苯,是一种重要的小分子有机半导体材料,可以用以制备红荧烯有机场效应管和太阳能光伏器件。本文首先对传统的热蒸发真空系统进行改造,使之能蒸镀有机薄膜。在一定的蒸发温度下,经过不同蒸镀时间蒸镀红荧烯薄膜,蒸镀时间分别为5,6,7,8 h,获得了具有多晶结构的红荧烯薄膜,并对其形貌进行了分析。结果表明非晶结构的红荧烯薄膜首先在硅衬底上生长,非晶红荧烯薄膜生长至一定厚度后,多晶结构的红荧烯从其中形成。The rubrene（5,6,11,12-tetraphenylnaphthacene） films were deposited by vacuum evaporation on Si substrates.The impacts of the deposition conditions,such as the pressure,evaporation temperature,and deposition time,on microstructures and properties of the small molecule,semiconductor,organic rubrene films were evaluated.The surface morphologies of the rubrene films were characterized with optical microscope and multimode atomic force microscopy.The results show that the vacuum evaporation time strongly affects the microstructures of the rubrene films.For example,after vacuum evaporation at 100～110℃ for 7～8 h,the rubrene films were found to be polycrystalline.The growth of polycrystalline rubrene started only after a certain thickness of the amorphous rubrene films formed at the initial stage on the Si substrate.

关 键 词：红荧烯 薄膜 真空蒸发 表面形貌 

分 类 号：TN304.51[电子电信—物理电子学]