α″- Fe_(16)N_2薄膜结构热稳定性的研究  

Study of the stability of structure ofα″- Fe_16N2 thin films

作　　者：许英华[1] 白海力[1] 侯登录[1] 王怡[1] 姜恩永[1] 

机构地区：[1]天津大学理学院应用物理学系,天津300072

出　　处：《信息记录材料》2000年第1期9-11,共3页Information Recording Materials

摘　　要：α″- Fe16N2的结构及其高饱和磁化强度是磁性材料研究中最有争议的问题。本文用对向靶反应溅射法制备了α″- Fe16N2薄膜 ,用 X射线衍射 (XRD)、透射电子显微镜 (TEM)和振动样品磁强计 (VSM)对其结构、磁性以及结构的热稳定性进行了分析讨论。结果表明 ,随退火温度的升高 , α″- Fe16N2相逐渐分解为α- Fe和α′- Fe4N两相。The structure and high saturation magnetization ofα″- Fe16N2 are the most disputable problems in magnetic material research.This article describes theα″- Fe16N2 thin films prepared by Facing Targets Sputtering,and studies its structure、 magnetic thin films prepared by Facing Targets Sputtering,and studies its stucture、 magnetic and stability properties by XRD ,TEM and VSM.It shows,α″- Fe16N2 decomposes into α- Fe、γ′- Fe4 N with the temperature rising.

关 键 词：饱和磁化强度 对向靶溅射 Fe16N2薄膜 热稳定性 

分 类 号：TQ586.2[化学工程—精细化工] TQ587.1