三氯氢硅合成的热力学  

Thermodynamic Study on Trichlorosilane Synthesis

作　　者：彭如振[1] 俞小花[1,2] 谢刚[2] 姚云[1] 

机构地区：[1]昆明理工大学冶金与能源工程学院,昆明650093 [2]云南冶金集团股份有限公司技术中心,昆明650031

出　　处：《有色金属（冶炼部分）》2012年第9期55-59,68,共6页Nonferrous Metals（Extractive Metallurgy)

基　　金：国家自然科学基金资助项目(50574045)

摘　　要：应用factsage软件研究三氯氢硅合成的复杂化学反应,绘制了体系中存在的8个化学反应的ΔG-T图。分析了当反应达到平衡,在0.01MPa、0.05 MPa和0.1 MPa以及进料比xHCl/xSi为1、3和6时,气相平衡组分分布与温度的关系。讨论了三氯氢硅产率随温度、压强及进料比xHCl/xSi的变化情况。结果表明,低温、高压和一定进料比xHCl/xSi对三氯氢硅合成过程有利。The complex chemical reactions of trichlorosilane synthesis were investigated by means of thermodynamic software factsage.Diagrams of for the eight chemical reactions in this system versus temperature were plotted.When the reaction reached equilibrium,the relationship between gas phase compositions and temperature was analyzed at HCl/Si molar ratio of 1,3 and 6 under the pressure of 0.01 MPa,0.05 MPa and 0.1 MPa,respectively.The variation of trichlorosilane productivity with temperature,pressure and HCl/Si molar ratio were discussed.The results show that a lower temperatures,a higher pressures and a suitable HCl/Si molar ratio have a positive effect on the trichlorosilane synthesis process.

关 键 词：三氯氢硅 热力学 产率 化学平衡 

分 类 号：TF01[冶金工程—冶金物理化学] TN304.12[电子电信—物理电子学]