清洗对偏振分光膜损伤阈值的影响  

Influence of substrate cleaning on laser-induced damage threshold of polarizers

作　　者：叶晓雯[1] 王孝东[1] 程鑫彬[1] 马彬[1] 丁涛[1] 沈正祥[1] 王占山[1] 

机构地区：[1]同济大学精密光学工程技术研究所,上海市特殊人工微结构材料与技术重点实验室,上海200092

出　　处：《强激光与粒子束》2012年第10期2338-2342,共5页High Power Laser and Particle Beams

基　　金：国家自然科学基金项目(61008030);上海市晨光计划项目(10CG19);教育部博士点基金项目(20100072120037)

摘　　要：采用微分干涉显微镜、扫描电镜和聚焦离子束观察了偏振分光膜损伤的形貌,从损伤机理出发,研究了清洗对偏振分光膜损伤阈值的影响。结果表明:清洗能有效去除表面杂质,清洗质量越好,基板上的杂质尺寸越小,杂质密度也越小,相应的偏振分光膜S光的损伤阈值越高;清洗能有效去除基板表面的纳米吸收中心,吸收性杂质分布密度越小,吸收峰越低,P光的损伤阈值越高。Influence of cleaning process on laser-induced damage threshold of polarizers was studied. Nomarski microscope was used to inspect the cleaned substrate surface, scanning electron microscope combining with focus ion beam technologies was used to characterize the damage morphologies of polarizers. The initiators that trigger laser damage were correlated with cleaning process. Proper cleaning process resulted in fewer residual particles and nodules in the prepared polarizer, which increased the la- ser induced damage threshold （LIDT） for S-polarization. Moreover, the absorption peak of substrates became lower and sharper when surface contaminations were removed, which improved the LIDT of P-polarization. In conclusion, cleaning is an effective way to increase LIDTs of polarizers.

关 键 词：偏振分光膜 清洗 弱吸收 损伤阈值 电子束蒸发 

分 类 号：O484.4[理学—固体物理]