掺Ti量对类金刚石薄膜机械性能的影响  

The Effect of Ti Content on Mechanical Properties of DLC Films

作　　者：祝闻[1] 冉春华[1] 金义栋[1] 聂朝胤[1] 王振林[2] 

机构地区：[1]西南大学材料科学与工程学院,重庆400715 [2]重庆理工大学材料科学与工程学院,重庆400050

出　　处：《表面技术》2012年第5期7-10,共4页Surface Technology

基　　金：重庆市科技攻关项目(CSTC;2008AC4017)

摘　　要：采用非平衡磁控溅射技术,通过改变Ti靶溅射电流,在不锈钢衬底表面沉积了不同掺Ti量的类金刚石薄膜(Ti-DLC),研究了掺Ti量对薄膜的显微硬度、弹性模量、膜/基结合强度、断裂韧性及摩擦磨损行为的影响。结果表明:DLC薄膜掺杂Ti后,硬度明显提高,且随着Ti靶溅射电流的增大,薄膜硬度先增加、后降低,Ti靶溅射电流为1.5A时,薄膜硬度最高;掺杂适量的Ti,可以明显改善DLC薄膜的膜/基结合强度和断裂韧性,并能明显降低DLC薄膜的摩擦系数。Using unbalanced magnetron sputtering technique, diamond-like carbon films with different titanium contents（Ti-DLC） were deposited on stainless steel substrates by changing Ti target supttering current. Investigated the influences of Ti content on microhardness, elastic modulus, film-substrate cohesion, fracture toughness, friction and wear behavior of films. Results showed that the hardness of the Ti-DLC films increases obviously compared with the pure DLC films. In the meantime, the hardness of the Ti-DLC films increases first and then decreases with the increase of the Ti target sputtering current and reaches the highest when Ti target sputtering current is increased to 1.5A. Film substrate cohesion and fracture toughness of the films are improved by depositing some Ti. The friction coefficient of DLC films decreases significantly with the deposition of Ti .

关 键 词：非平衡磁控溅射 掺Ti类金刚石薄膜 结合强度 摩擦磨损性能 

分 类 号：TN305.92[电子电信—物理电子学] O484[理学—固体物理]