原子光刻中驻波场与基片距离的判定方法研究  

Method of identifying the relative position between standing wave of laser light and substrate in atom lithography

作　　者：王建波[1] 钱进[1] 殷聪[1] 石春英[1] 雷鸣[2] 

机构地区：[1]中国计量科学研究院长度所,北京100013 [2]中国国防科技信息中心,北京100036

出　　处：《物理学报》2012年第19期106-110,共5页Acta Physica Sinica

基　　金：国家科技支撑计划(批准号:2006BAF06B08)资助的课题~~

摘　　要：原子光刻实验中,激光驻波场能起到原子透镜的效果,实现原子汇聚.激光驻波场与沉积基片间的距离对形成纳米条纹结构的质量具有重要影响.利用高斯光束传播规律,提出了一种能够定量判断激光驻波场与沉积基片相对位置的实验方法.该方法通过调节装载有凸透镜和反射镜的精密位移台改变驻波场距基片的距离,利用光电探测器接收反射光强的变化,将位移改变量转变为接收器的电压信号.利用驻波场激光束光斑直径值,实现准确定位驻波场与基片的距离.对上述实验过程进行数值模拟,数值计算的结果和实验结果高度符合.该方法实现了准确定位驻波场距基片的距离,为后续深入研究驻波场和基片间距离对沉积纳米条纹结构质量的影响提供实验基础.Standing wave of laser light acts as an array of lenses to focus the moving atoms in atom lithography. The position between standing wave and substrate plays an important role in determining the quality of depositional nanometer lines. Using the rule of Gaussian beam, a method of accurately identifying the position of standing wave of laser light is reported. By adjusting accurately the displacement stage which carries the beam focus lens and reflective mirror, the laser beam is subsequently shielded by depositional substrate. Signal of photoelectric detector is changed because of shielding the standing wave, so we can convert the displacement of standing wave into electrical signal. Positioning the standing wave against substrate is achieved by using the value of waist diameter of standing wave of laser light. Theoretical model is developed according to the experimental process. The result of numerical computation coincides well with the experimental record. This method realizes accurately positioning standing wave of laser light against substrate, and it provides the experimental basic for deeply studying the influence of the distance between standing wave and substrate on the quality of depositional nanometer lines.

关 键 词：原子光刻 原子沉积 一维纳米光栅 激光驻波场 

分 类 号：TN305.7[电子电信—物理电子学]