氮流量对ZnO:N薄膜微结构及光学性能影响  

Effects of Nitrogen Flow on the Micro-Structure and Optical Properties of ZnO:N Films

作　　者：朱华[1,2] 况慧芸[2] 冯晓炜[2] 万文琼[2] 

机构地区：[1]景德镇陶瓷学院机电学院,景德镇333001 [2]景德镇陶瓷学院科技艺术学院工程系,景德镇333001

出　　处：《人工晶体学报》2012年第5期1280-1285,共6页Journal of Synthetic Crystals

摘　　要：运用射频磁控溅射技术,改变氩、氮流量比(9/1～9/4)在玻璃衬底上获得ZnO∶N样品,采用XRD、紫外-可见分光光度计、傅里叶红外光谱仪及SEM对薄膜微结构和光学性能表征。结果发现∶N流量小,样品XRD峰强小,峰位不明显,紫外可见光光谱在320～780 nm波长区间透射率变化小;随着N流量的增加,样品XRD有(002)强单峰出现,在400 nm波长以下透射率急剧下降;当氩氮流量达到9/4,样品XRD出现双峰,紫外光透射率无明显变化。Using the radio frequency reactive magnetron sputtering technique,ZnO：N thin films were fabricated on glass substrate by changing the Ar/N2 flow ratio from 9/1 to 9/4.The samples were characterizated on the film microstructure and optical properties by XRD,UV-visible spectrophotometer,Fourier transform infrared spectroscopy and SEM.The XRD results showed that no significant peaks appeared at less N flow and the light transmission rate of UV-Vis had Small fluctuations between 320-780 nm wavelength;As N flow increasing,there was only（002） single peak in curves of XRD,transmittance of UV had a sharp decline below the 400 nm wavelength;when argon-nitrogen flow ratio increased to 9/4,curves of XRD showed two peaks near 34° of 2θ,no significant changes occurred in UV transmittance.

关 键 词：ZnO∶N薄膜 透射率 磁控溅射 

分 类 号：O484[理学—固体物理]