辅助气体压强比例对中频脉冲非平衡磁控溅射沉积类金刚石薄膜结构与性能的影响  

Effects of the mixed gas ratio on the microstructure and properties of diamond-like carbon films deposited by middle frequency pulsed unbalanced magnetron sputtering

作　　者：代海洋[1] 翟凤潇[1] 陈镇平[1] 

机构地区：[1]郑州轻工业学院技术物理系,河南郑州450002

出　　处：《真空》2012年第6期50-54,共5页Vacuum

基　　金：郑州轻工业学院博士科研基金资助项目(2010BSJJ030)

摘　　要：以高纯石墨为靶材、氩气(Ar)和甲烷(CH4)为辅助气体,利用中频脉冲非平衡磁控溅射技术在不同气体压强比例下制备了类金刚石薄膜,采用原子力显微镜、拉曼光谱仪、傅立叶变换红外光谱仪、纳米压痕测试仪对所制备薄膜的表面形貌、微观结构、机械性能进行了分析。结果表明:当Ar气压强比例由17%增加到50%时,类金刚石薄膜的RMS表面粗糙度、sp3杂化键含量、纳米硬度、弹性模量随Ar气压强比例的增加而增加,当Ar气压强比例由50%增加到86%时,薄膜的RMS表面粗糙度、sp3杂化键含量、纳米硬度、弹性模量随Ar气压强比例的增加而减小。以上结果说明辅助气体压强比例对类金刚石薄膜的表面形貌、微观结构、机械性能有较大的影响。With the methane-argon mixed gas as assistant gas and high purity graphite as target, diamond-like carbon （DLC） films were prepared by middle frequency pulsed unbalanced magnetron sputtering with different methane-argon gas ratios. These films were characterized by atomic force microscopy （AFM）, Fourier transform infrared spectroscopy, Raman spectroscopy and nano indentation. The experimental results reveal that the surface roughness, sp3 fraction, nanohardness and elastic modulus of the films increase with increasing Ar concentration from 17% to 50%, while decrease when Ar concentration is above 50%. These results indicate that the mixed gas ratio has a strong influence on the surface morphology, microstructure and mechanical properties of the DLC films.

关 键 词：类金刚石膜 中频脉冲非平衡磁控溅射 气体压强比例 结构与性能 

分 类 号：O484.1[理学—固体物理] O484.4[理学—物理]