镀制工艺对金刚石薄膜透射率的影响  

The Influence of Technologic Conditions to Transmittance of Diamond Film

作　　者：李云[1] 徐建刚[1] 

机构地区：[1]西安邮电大学理学院,西安710121

出　　处：《科学技术与工程》2012年第33期8984-8986,共3页Science Technology and Engineering

基　　金：陕西省教育厅项目(2010JK844)资助

摘　　要：用磁控溅射法制备金刚石薄膜,研究了工作气压,溅射电流、镀膜时间三个参数对金刚石薄膜透射率的影响。得到最佳工艺参数:工作气压1.3 Pa,溅射电流0.4 A,镀膜时间2 min。镀制的金刚石薄膜可以作为红外元件的保护膜与增透膜。Diamond films are successfully prepared by magnetron sputtering. Then the influence of technologic conditions to the transmittance of diamond film is researched, such as work vacuum, sputtering current and preparing time. Optimal technologic conditions are obtained, they are 1.3 Pa work vacuum, 0. 4 A sputtering current and 2 min preparing time.

关 键 词：磁控溅射 金刚石薄膜 透射率 

分 类 号：O484[理学—固体物理]