直流磁控溅射法在玻璃上沉积金属镍膜的研究  

Properties of Nickel Coating Deposited on Glass by DC Magnetron Sputtering

作　　者：韩丽[1] 

机构地区：[1]河北工程大学土木工程学院,邯郸056038

出　　处：《表面技术》2012年第6期65-67,共3页Surface Technology

基　　金：河北省建设厅资助项目(2009-129)

摘　　要：采用直流磁控溅射法,在玻璃基板上制备了用于显示器视窗保护玻璃的半透明镍膜,测定了不同溅射条件下所得镍膜的表面粗糙度、透过率及厚度,讨论了溅射气压、溅射功率、行车速度等对薄膜性能的影响。结果表明,薄膜的表面粗糙度随溅射功率的增加而增大,控制溅射气压、溅射功率和行车速度为一定值,可以得到透过率为50%的半透镍膜。Semitransparent nickel coating used for cover lens of display was deposited on glass substrate by DC magne- tron sputtering, the variation of surface roughness, transmittance and thickness of the nickel coating obtained with different sput- tering process was tested. The influence of sputtering gas pressure, sputtering power and carrier moving speed on coating proper- ties were discussed. The result shows that the surface roughness of the coating increases along with the increase of sputtering power, the nickel coating with 50% transmittance can be obtained with appropriate sputtering gas pressure, sputtering power and carrier moving speed.

关 键 词：磁控溅射 半透镍膜 液晶显示 真空镀膜 

分 类 号：TG174.444[金属学及工艺—金属表面处理]