无配位剂酸性镀液中Ni-W合金电镀层的性能  

Microstructure and Corrosion Resistance of Electroplated Nickel-Tungsten Alloy Coatings

作　　者：廖夏[1] 王为[1] 

机构地区：[1]天津大学化工学院,天津300072

出　　处：《材料保护》2012年第12期24-26,2,共3页Materials Protection

摘　　要：柠檬酸镀液体系电沉积Ni-W合金层,作为配位剂的柠檬酸根离子易在阳极发生氧化,造成镀液不稳定,进而影响镀层的质量。为此,采用无配位剂酸性体系,通过脉冲和直流方法制备了Ni-W合金镀层。采用X射线荧光光谱(XRF)、X射线衍射(XRD)、扫描电镜(SEM)分析了Ni-W合金镀层的成分、结构、形貌,用线性扫描曲线法研究了其耐蚀性能。结果表明:脉冲电沉积Ni-W合金层具有面心立方结构,镀层表面的平整性、硬度和耐蚀性能都得到了提高,且优于直流电沉积Ni-W合金层。Ni-W alloy coatings were prepared by pulse electrodeposition and direct current electrodeposition in an acid electroplating bath without citric acid as the complexant.The composition,structure and morphology of as-obtained Ni-W alloy coatings were analyzed by X-ray diffraction,X-ray spectrometry and scanning electron microscopy.The corrosion resistance of the coatings was evaluated by linear scanning polarization curve method.Results reveal that Ni-W alloy coating prepared by pulse electrodeposition consists of face centered cubic phase crystalline.As compared with the Ni-W alloy coating prepared by direct current electrodeposition,the one prepared by pulse electrodeposition is smoother and possesses higher hardness and better corrosion resistance.

关 键 词：Ni-W合金镀层 脉冲电镀 直流电镀 硬度 耐蚀性能 

分 类 号：TQ153.2[化学工程—电化学工业]