A new method to characterize the metallic-oxide films for grayscale lithography  

A new method to characterize the metallic-oxide films for grayscale lithography

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作  者:孙立萍 张双根 王喆 邓家春 吕江 

机构地区:[1]School of Science, Tianjin University of Technology [2]Tianjin Key Laboratory of Film Electronic and Communication Device, Engineering Research Center of Communication Devices, Ministry of Education, Tianjin University of Technology

出  处:《Optoelectronics Letters》2013年第1期34-37,共4页光电子快报(英文版)

基  金:supported by the National Natural Science Foundation of China (Nos.11004152 and 11204213);the Program of Tianjin Municipal Education Commission (No.20090715);the Tianjin Natural Science Foundation (No.12JCQNJC00800)

摘  要:In order to characterize the metallic-oxide grayscale films fabricated by laser direct writing (LDW) in indium film, a new method with micro-Raman spectroscopy and atomic force microscope (AFM) is proposed. Raman spectra exhibit the characteristic band of In2O3 centered at 490 cm -1 , in which the intensities increase with the decreasing optical density of the In-In2O3 grayscale films. The mapping information of Raman spectra shows that the signal intensities of the film in the same grayscale area are uniform. Combining with the information of In-In2O3 grayscale film from AFM, the quantitative relationship between the concentration of In2O3 and the Raman signal intensity is shown. Compared with the conventional methods, the resolution of micro-Raman scattering method is appropriate, and the scanning speed is proper to analyze the structure of metallic-oxide grayscale films.In order to characterize the metallic-oxide grayscale films fabricated by laser direct writing (LDW) in indium film, a new method with micro-Raman spectroscopy and atomic force microscope (AFM) is proposed. Raman spectra exhibit the characteristic band of ln2O3 centered at 490 cm-1, in which the intensities increase with the decreasing optical density of the ln-ln2O3 grayscale films. The mapping information of Raman spectra shows that the signal intensities of the film in the same grayscale area are uniform. Combining with the information of In-In2O3 grayscale film from AFM, the quantitative relation- ship between the concentration ofln2O3 and the Raman signal intensity is shown. Compared with the conventional methods, the resolution of micro-Raman scattering method is appropriate, and the scanning speed is proper to analyze the structure of metallic-oxide grayscale films.

关 键 词:金属氧化膜 灰度 光刻技术 金属氧化物薄膜 显微拉曼光谱 氧化铟薄膜 原子力显微镜 信号强度 

分 类 号:TN305.7[电子电信—物理电子学] TM544.5[电气工程—电器]

 

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