RBS和XRD研究Fe、N共掺ZnO薄膜的制备  

RBS and XRD study on preparation of Fe and N codoped ZnO film

作　　者：张斌[1] 荣丽媛[1] 李敏[1] 王建中[1] 施立群[1] 

机构地区：[1]复旦大学现代物理研究所,上海200433

出　　处：《核技术》2013年第2期7-10,共4页Nuclear Techniques

基　　金：国家自然科学基金(10775033;11075038);上海市重点学科建设项目(B107)资助

摘　　要：以Zn3N2:Fe为前驱物,用热氧化法在石英玻璃衬底上成功制备了一组Fe、N共掺杂的ZnO薄膜。用卢瑟福背散射(RBS)和X射线衍射(XRD)研究了Zn3N2:Fe在不同热氧化温度下的退火行为和结构演变。实验结果显示:刚长成的样品为Zn3N2:Fe薄膜;300oC氧化后,样品表层的Zn3N2:Fe转化为ZnO:(Fe,N),表层以下的膜层未被氧化;退火温度高于400oC时,Zn3N2:Fe薄膜全部转化为多晶结构的ZnO:(Fe,N)薄膜;500oC退火,薄膜开始向衬底扩散;600oC–700oC退火,薄膜向衬底扩散明显。在XRD灵敏度范围内,薄膜中未发现Fe团簇或与Fe相关的二次相(如Fe3O4、Fe2O3、FeO)。SQUID测量显示:在500oC退火条件下,ZnO:(Fe,N)薄膜的室温饱和磁化强度(Ms)最大。Background： ZnO-based diluted magnetic semiconductors （DMSs） have attracted much attention for their potential applications in spintronics, which utilizes both the spin degree of freedom and electronic charge. After Dietl et al. theoretically predicted that ZnO doped with 5 at% Mn might exhibit room temperature ferromagnetism, most studies were focused on this system. The other transition metal such as Fe doped ZnO DMSs were rarely studied, especially, Fe and N codoped ZnO system. The thermal oxidation method, a very simple method, was used to prepare the ZnO：（Fe, N） films. First, Zn3N2： Fe films were grown by radio frequency （RF） reactive magnetron sputtering on quartz substrates and then annealed in oxygen atmosphere at different temperatures for 2 h. Purpose： This paper attempted to study annealing behavior and structural evolvement of Zn3N2：Fe at the different annealing temperature. Methods： Rutherford backscattering spectrometry （RBS） was a very powerful tool to study the growth of thin film. Therefore in this paper RBS combining with X-ray diffraction （XRD） was used to study the preparation of the ZnO：（Fe, N） films. Results： The results showed that the as-grown sample was Zn3N2：Fe film. After annealed at 300℃, Zn3N2：Fe in the surface had transformed to ZnO：（Fe, N） and the film under the surface was not oxidated. After annealed above 40℃, the Zn3N2：Fe film had entirely transformed to the polycrystalline ZnO：（Fe, N） film. Annealed at 500℃, the film started to diffuse into the substrate and at 600℃-700℃, the diffusion was very obvious. Conclusions： RBS combining with XRD can effectively study the preparation of the ZnO：（Fe, N） films. Within the range of the sensitivity, no precipitates such as Fe cluster or Fe304, Fe2O3 and FeO were observed by XRD. From SQUID, the maximum of the saturation magnetic moment （Ms） at room temperature appeared at 500℃.

关 键 词：卢瑟福背散射 X射线衍射 热氧化法 ZNO (Fe N)薄膜 

分 类 号：TQ138.11[化学工程—无机化工] O484.1[理学—固体物理]