8×8阵列压电厚膜驱动变形镜的制备及性能研究  

Study on Preparing Methods and Performances of 8×8 Arrays Bimorph Deformable Mirror with Piezoelectric Ceramics Plate

作　　者：刘相果[1] 胡东霞[2] 冯小东[1] 曾祥明[1] 

机构地区：[1]中国电子科技集团公司第26研究所,重庆400060 [2]中国工程物理研究院激光聚变研究中心,四川绵阳621900

出　　处：《压电与声光》2013年第1期66-69,共4页Piezoelectrics & Acoustooptics

摘　　要：利用流延工艺制备大尺寸高性能压电陶瓷片(100mm×100mm×0.50mm),在此基础上研究8×8阵列排布的厚膜压电陶瓷驱动连续变形镜的制备工艺技术,并对变形镜的理论拟合面形和实际闭环控制校正面形进行研究分析。结果表明,变形镜的初始面形的像差振幅为2.664λ,像差均方根振幅为0.557λ,而经闭环控制校正+手动微校正后后,获得较佳的镜面效果像差振幅为0.36λ,像差均方根振幅为0.095λ;闭环控制校正面形与理论拟合的面形(像差振幅为0.005λ,像差均方根振幅为0)存在一定差距,主要原因是变形镜制备工艺过程或驱动闭环控制系统存在一定的滞后性或试验误差造成的。The piezoelectric ceramic plate with high performance and large size of 100 mm N 100 mm X 0. 5 mm has been prepared by the casting technique, and the preparation technique of a 8X 8 array bimorph deformable mirror with piezoelectric ceramic plate was studied in this work. The theoretical and practical compensation and correc tion for aberrations of bimorph deformable mirror were investigated by the feedback control technology. The results showed that the aberrations amplitude of bimorph deformable mirror before correcting with feedback control technol ogy was 2. 664λ and RMS was 0. 557λ, while after correcting, the aberrations amplitude was 0.36λand RMS was 0. 095λ. There exist some differences between theoretically correcting （0. 005,1 and RMS was 0） and practically cor recting, which was caused by the following reason： unperfected gluing technology, hysteresis of testing system, tes ting irregularities, and so on.

关 键 词：大尺寸厚膜压电陶瓷 流延工艺 变形镜 闭环控制 

分 类 号：TN282[电子电信—物理电子学]