脉冲激光沉积制备TiO_2薄膜的性能  

Properties of TiO_2 Films Deposited by Pulsed Laser Deposition

作　　者：邢晓[1] 王文军[1] 李淑红[1] 刘云龙[1] 张栋[1] 史强[1] 高学喜[1] 张丙元[1] 

机构地区：[1]聊城大学物理科学与信息工程学院,山东省光通信科学与技术重点实验室,山东聊城252059

出　　处：《中国激光》2013年第2期178-183,共6页Chinese Journal of Lasers

基　　金：国家自然科学基金(61275147);山东省优秀中青年科学家科研奖励基金(BS2009DX014);山东省科技攻关计划(2010GGX10127);聊城大学重点科研基金资助课题

摘　　要：采用脉冲激光沉积(PLD)的方法在玻璃衬底上制备了二氧化钛薄膜,研究了基片温度和氧压对薄膜表面形貌、晶体结构和光学性能的影响。结果表明:当基片温度低于300℃或高于400℃时,二氧化钛薄膜的折射率都随着基片温度的升高而增大;基片温度处于300℃～400℃之间时,折射率随着基片温度的升高而降低;基片温度为300℃时,折射率最大。薄膜的折射率随着氧压的增大而减小。X射线衍射仪(XRD)显示薄膜在基片温度低于300℃时为非晶态结构,在300℃时出现了锐钛矿结构,当基片温度升高到500℃时,薄膜仍为锐钛矿结构;300℃时,薄膜的A(101)衍射峰最强,结晶度最好。通过原子力显微镜(AFM)图分析得出:低于300℃时,随着基片温度的升高,二氧化钛薄膜的晶粒尺寸增大,聚集密度增大;高于300℃时,晶粒的平均尺寸大小几乎不变,300℃时,晶粒排列最均匀有序。根据薄膜的透射谱计算了薄膜的光学带隙,可知随着基片温度的升高,二氧化钛薄膜的带隙变窄;随着氧压的增大,带隙变宽。The TiO2 films are deposited on glasses by pulsed laser deposition （PLD）, and the effects of substrate temperature and oxygen pressure on the surface morphology, structure and optical properties of TiO2 films are studied. The results show that the refractive index of TiO2 films increases until the substrate temperature reaches 300 ℃ , decreases from 300 ℃ to 400 ℃, increases from 400 ℃ to 500 ℃, and gets the maximum at 300 ℃. The refractive index decreases when the oxygen pressure getting higher. The X-ray diffraction （XRD） diagrams demonstrate that the structure of Ti02 films are all amorphous when the growth temperature is under 300 ℃, transforms into anatase structure at 300 ℃, and keeps anatase from 300 ℃ to 500 ℃. The crystallization degree is the best at 300 ℃. The atomic force micrographs （AFM） of the Ti02 films manifest that the particle size increases with the substrate temperature increasing till 300 ℃. When the substrate temperature exceeds 300 ℃, the average particle size remain unchanged almost, and the grain arrangement is best-orderly when the substrate temperature is 300 ℃. According to the transmission spectra, the band gap width of TiO2 thin films is calculated. It is recorgnized that the width of the band gap gets wider while the substrate temperature goes up, but narrower while the oxygen pressure increases.

关 键 词：薄膜 TIO2 折射率 基片温度 氧压 透射谱 带隙 

分 类 号：O484.4[理学—固体物理]