磁控溅射用CoCrPt系靶材制备技术研究进展  

Research Progress of CoCrPt System Targets Fabrication

作　　者：陈松[1] 耿永红[1] 王传军[1] 闻明[1] 张俊敏[1] 毕珺[1] 李艳琼[1] 谭志龙[1] 张昆华[1] 管伟明[1] 

机构地区：[1]昆明贵金属研究所稀贵金属综合利用新技术国家重点实验室,昆明650106

出　　处：《贵金属》2013年第1期74-78,共5页Precious Metals

基　　金：国家科技部院所技术开发专项(2010EG215060);云南省院所技术开发专项(2009CF003);国家基金项目(U0837601);云南省基金项目(2010CD126;2010ZC55)资助

摘　　要：目前在高密度磁记录薄膜中大量使用到CoCrPt系溅射靶材。重点介绍了CoCrPt系磁性靶材国内外发展现状,靶材制备中的主要工艺以及质量控制内容和方法,最后分析了存在的技术难点和需要解决的问题。The CoCrPt system sputtering target has been widely used in high density of layer thin-film magnetic recording storage media preparation. The research progress on CoCrPt system sputtering targets was summarized from resent relevant patents and reports. The process and preparation methods of those magnetic sputtering targets were mainly discussed and analyzed. The key points of target＇s quality control were listed and studied in detail. At last, important technology problems and main difficulties which occurred in CoCrPt system sputtering target were discussed.

关 键 词：金属材料 粉末冶金 COCRPT 溅射靶材 熔铸法 质量控制 

分 类 号：TG146.4[一般工业技术—材料科学与工程]