应力对薄膜结构与性能影响的研究现状  

Study Status on the Impact of Stress on Structure and Properties of Films

作　　者：冉春华[1] 金义栋[1] 祝闻[1] 聂朝胤[1] 

机构地区：[1]西南大学材料科学与工程学院,重庆400715

出　　处：《材料导报》2013年第5期139-142,共4页Materials Reports

基　　金：重庆市科技攻关计划项目(CSTC2008AC4017);国家自然科学基金面上项目(51271153)

摘　　要：产生薄膜应力是在沉积薄膜过程中普遍存在的现象。薄膜应力的存在将影响薄膜的微观结构和性能,如薄膜的光学、力学等物理性能。同时影响到薄膜与基体材料的结合度以及基体材料的基本性能。主要总结了薄膜应力的产生机理、测试方法及其对薄膜结构和性能的影响,同时对薄膜应力的有效控制提出了展望。The formation of film stress is a common phenomenon during the film depositions, which will affect the microstructure and properties of the film, such as optical,mechanical and other physical properties. It will also af- fects the binding between film and substrate as well as the basic properties of substrate materials. The formation mechanism, test methods, structure and properties of thin films are summarized. Effective control of film stress is also presented.

关 键 词：薄膜应力 薄膜结构 薄膜性能 

分 类 号：TG703[金属学及工艺—刀具与模具]