超细晶TiNi表面磁控溅射CNx薄膜的纳米压痕与摩擦性能  

Nanoindentation and Friction Properties of Magnetron Sputtered CNx Films on Ultrafine Grained TiNi Alloy

作　　者：许晓静[1] 刘敏[1] 张体峰[1] 凌智勇[1] 盛新兰[1] 陈丹[1] 

机构地区：[1]江苏大学,江苏镇江212013

出　　处：《稀有金属材料与工程》2013年第3期585-588,共4页Rare Metal Materials and Engineering

基　　金：江苏省高校自然基金重大项目(11KJA430004);江苏大学优秀学术青年骨干培养对象基金(1211110001)

摘　　要：采用室温磁控溅射技术在超细晶TiNi合金表面制备出CNx/SiC(氮化碳/碳化硅)双层薄膜,SiC为中间层。研究了CNx薄膜的组织结构、纳米压痕和摩擦性能。结果表明:CNx薄膜存在微孔缺陷(基体中夹杂物脱落等原因引起)、石墨含量高、纳米硬度(5.23GPa)低、弹性模量(33.29GPa)低,但具有高的硬度与弹性模量比值(0.157)。在200g载荷、氮化硅球(半径为2mm)为对摩件、大气干摩擦条件下,CNx薄膜的摩擦系数约为0.173,磨损后薄膜未出现裂纹和剥落;在500g载荷、室温Kokubo人体模拟体液下,CNx薄膜的摩擦系数约为0.103,但磨损后薄膜出现剥落。剥落的发生可能是由于SBF溶液通过微孔缺陷进入并腐蚀薄膜-薄膜-基材界面所致。The microstructure,nano-indentation and friction properties of the CNx/SiC（carbon nitride/silicon carbon） bilayered films（SiC as interlayer）,deposited on ultrafine-grained TiNi alloy substrate using magnetron sputtering technique at room temperature,were investigated.The results show that the CNx film is not fully compact with micro-pore defections in some zones,which has been possibly caused by the breaking off of inclusions in substrates.The CNx film presents high concentration graphite,low nano-hardness（5.23 GPa）,low Young＇s modulus（33.29 Pa）,but high hardness-to-modulus ratio（0.157）.As sliding against Si3N4（silicon nitride） balls（2 mm in radius）,under ambient environment and 200 g load,the CNx film exhibits the friction coefficient of about 0.173 without film cracking and interface delaminating.On the other hand,under Kokubo simulation body fluid（SBF） and 500 g load,the CNx film exhibits the friction coefficient of about 0.103,but the interface delaminating occurs that is believed to be due to that the SBF enter into the film-film-substrate interfaces through micro-pores defections and corrode the interfaces.

关 键 词：TiNi基材 薄膜 微结构 纳米压痕 摩擦性能 磁控溅射 

分 类 号：TG174.4[金属学及工艺—金属表面处理]