竖壁降液膜流动纵向及水平发展规律研究  

Horizontal and Longitudinal Characteristics of Water Film Falling on Vertical Plate

作　　者：韦胜杰[1] 殷煜皓[1] 胡珀[1] 杨燕华[1] 

机构地区：[1]上海交通大学核科学与工程学院,上海200240

出　　处：《原子能科学技术》2013年第2期213-217,共5页Atomic Energy Science and Technology

基　　金：国家科技重大专项基金资助项目(2010ZX06002-005)

摘　　要：采用高频率电容式测厚仪测量并分析了降液膜膜厚和波动的统计规律,得到了降液膜沿竖直大平板流动平均膜厚经验关系式,发现了液膜流动的横向扩展和纵向发展规律。结果表明,降膜在竖直发展2.6m后可能已基本充分发展。The statistical characteristics and the wave of a water film freely falling down a large vertical flat plate were investigated by capacitance probe, and the correlation of the mean film thickness based on Reynolds number was obtained. The way how the film extends horizontally was obtained, and the longitudinal characteristics show that the flow may be fully developed at 2.6 m from the origin.

关 键 词：降液膜 膜厚 波动 流动发展 

分 类 号：TL334[核科学技术—核技术及应用]