双工件台光刻机换台过程的轨迹规划及控制  

Trajectory planning and control method for wafer stage exchange process of dual-stage lithography

作　　者：武志鹏[1] 陈兴林[1] 李欣[1] 姜晓明[1] 刘川[1] 

机构地区：[1]哈尔滨工业大学控制科学与工程系,哈尔滨150001

出　　处：《哈尔滨工业大学学报》2013年第3期7-13,共7页Journal of Harbin Institute of Technology

基　　金：国家科技重大专项资助项目(2009ZX02207)

摘　　要：为减小双工件台光刻机的换台时间,提出了一种改进5阶S轨迹和时间-冲击最小控制算法.分析了双驱双桥换台策略,曝光位和预对准位的两个工件台依次执行5个点对点运动完成换台过程.在常规数值积分S轨迹设计方法中,增加了减小冲击的优化项,设计了改进5阶S轨迹使加速度曲线更加平滑.以换台过程的时间-冲击最小为优化指标,为工件台系统设计了最优控制算法从而大幅度减小换台时间,并且克服了单纯以时间最优Bang-Bang控制中加速度突变的缺点.仿真和实验结果表明,利用轨迹规划和最优控制方法可以实现快速换台运动,改进5阶S轨迹加速度曲线最平滑,时间-冲击最优控制比5阶S轨迹具有更短的换台时间.To reduce the exchange time of dual-stage lithography,a modified fifth-order S-curve planning method and a minimum-time and minimum-jerk control method are proposed.The dual-driver and dual-bridge exchange method of the wafer stages is analyzed,and the wafer stages on the exposure position and prealignment position make five point-to-point movements to complete the exchange process.A minimum-jerk optimization index is added to fifth-order S-curve based on numerical integration method,and a modified fifthorder S-curve planning algorithm is proposed to ensure the acceleration curve is smooth.Aiming at a minimumtime and minimum-jerk criterion,an optimal control system is designed to reduce the exchange time and overcome the default of controlling the acceleration mutation only by the minimum-time Bang-Bang control. Simulation and experiment results show that the exchange process can be realized by trajectory planning and optimal control method.The acceleration curve of modified fifth-order S-curve is the most smooth,and minimum-time and minimum-jerk optimal control system can achieve a shorter exchange time.

关 键 词：双工件台 时间-冲击最小 S轨迹 双驱双桥 

分 类 号：TP273.2[自动化与计算机技术—检测技术与自动化装置]