数字光刻系统的IC版图数据接口算法的研究  

The Study of IC layout Data Interface Algorithm for Maskless Lithography System

作　　者：李博[1,2] 刘俊标[1,2] 

机构地区：[1]中国科学院电工研究所,北京100190 [2]北京市生物电磁学重点实验室,北京100190

出　　处：《微电子学与计算机》2013年第5期79-83,共5页Microelectronics & Computer

基　　金：国家02专项(2009ZX02037)

摘　　要：针对基于数字微镜阵列(DMD)的数字无掩模光刻系统,提出了一种新型IC版图数据接口转化算法,建立了版图数据到曝光数据的转化接口.该接口根据数字光刻系统的需求,以IC版图中工艺层为单位,在保证曝光精度的前提下,可以自动将高精度的IC版图数据转化为与DMD同像素结构的灰度数据.接口兼容GDSII和CIF两种工业标准的IC版图数据,接口算法可以处理这两种IC版图数据中出现的所有基本图素.同时,利用矢量几何计算的方法,成功地解决了自交、重叠等特殊图素或以特殊方式组合图形的转换问题.实验证明,本接口算法具有低复杂度、高精度、高效率的特点,可以作为数字无掩模光刻系统有效的IC版图数据处理通道,对大规模集成电路的制作具有现实意义.Based on the maskless lithography system with DMD, a new IC layout data interface algorithm has been presented, which established the interface from layout data to exposure data. The interface can meet the needs of digital lithography system, using process layer as a unit to convert the high precision IC layout data into the gray data automatically with the same pixel structure with DMD. And the interface are compatible with the two industrial standard IC layout data of GDSII and CIF, which can easily deal with all of the basic graphic element of GDSII and CIF, meanwhile, it also can utilize the method of vector algorithm calculation to succeed in solving the difficult conversion in intersecting, overlapping or some other special composed graphic. After lots of experiment, it＇s proved that the interface has the capability of low complexity, high precision, and high efficiency. And it can he used as a new efficient passage to be research has practical significance to the production of the LSI.

关 键 词：IC版图数据 接口 无掩模光刻 单次曝光精度 矢量几何计算 DMD 

分 类 号：TN305.7[电子电信—物理电子学]