基于逆补偿复合控制的抛光液供给系统设计  

Design of polishing fluid supply system based on compound control of inverse compensation

作　　者：尹志生[1] 郑楠[1] 于淼[1] 彭吉[1] 闫丰[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,长春130033

出　　处：《电子测量与仪器学报》2013年第4期366-371,共6页Journal of Electronic Measurement and Instrumentation

基　　金：国家重大专项02专题(2009ZX2205)资助项目

摘　　要：根据磨料水射流抛光加工工艺要求,设计了一套以比例阀和溢流阀为流量调节元件的抛光液供给系统。但由于溢流阀在调节过程中的正反行程工作曲线不重合,导致系统存在较大的迟滞及非线性。针对这一情况,采用了前馈逆补偿及PID反馈的复合控制策略。并基于TMS320F2812DSP数字控制器,完成了传统PID控制策略和逆补偿复合控制策略的阶跃响应效果对比实验。结果表明,逆补偿复合控制策略能很好的改善系统响应品质,超调量和响应时间得到了明显减少,实现了抛光液射流流量的快速、高精度控制。According to the jet machining process requirements, a polishing fluid supply system is designed, in which the proportional valve and relief valve are the flow regulator element. However, due to the inconsistency of the relief valve＇s opening and closing curve, the system has a large hysteresis and nonlinear. Aiming at this situation, compound control strategy of inverse model feed-forward compensation and PID feedback are used to achieve high-precision control of the polishing liquid. Thus, based on TMS320F2812DSP digital controller, the contrast of step response between using traditional PID control strategy and the compound control strategy is completed. The experimental results show that the compound control strategy is well to improve the quality of system response. Moreover, the overshoot and response time is significantly reduced.

关 键 词：逆补偿 复合控制 抛光液供给 

分 类 号：TP273.3[自动化与计算机技术—检测技术与自动化装置]