希夫碱铜配合物修饰电极对抗坏血酸的电催化性能研究  

Electrocatalytic Properties of Schiff Base Copper(Ⅱ)Complex Modified Electrode for Ascorbic Acid

作　　者：曹亚飞[1] 李曦[1] 董玉林[1] 冯武[1] 熊燕[1] 李小雨[1] 刘信[1] 刘鹏[1] 

机构地区：[1]武汉理工大学理学院,武汉430070

出　　处：《武汉理工大学学报》2013年第5期45-49,共5页Journal of Wuhan University of Technology

基　　金：国家自然科学基金(51273155);中央高校基本科研业务费专项资金(2012-la-022);武汉理工大学国家级大学生创新创业训练计划(20121049714003);武汉理工大学开放实验基金(KF6020)

摘　　要：采用电沉积方法制备了[Cu(Sal-β-Ala)(3,5-DMPz)2]/GC电极。考察了修饰电极制备的最佳条件,同时研究了[Cu(Sal-β-Ala)(3,5-DMPz)2]/GC电极表面电荷传递过程特征以及对抗坏血酸的电催化行为。结果表明,在配合物浓度为0.3mmol/L时进行10圈循环伏安扫描制备的修饰电极对AA的催化效果最好。计时安培法研究显示,在AA浓度为0.01～0.35mmol/L的范围内,氧化电流与浓度之间存在良好的线性关系,灵敏度为55.20μA/(mmol.L-1),检出限为0.30μmol/L(S/N=3)。In this paper,the electrodeposition method is used to prepare [Cu（Sal-β-Ala）（3,5-DMPz）2] modified electrode.The optimum conditions to prepare the modified electrode were studied.The charge transfer properties on the surface of the modified electrode and its electrocatalytic behavior for ascorbic acid were also investigated.Preparing by the cyclic voltammetry in a DMSO solution containing 0.3 mmol/L [Cu（Sal-β-Ala）（3,5-DMPz）2]·2H2O for ten cycles,the modified electrode showed the best electrocatalytic effect on the oxidation of ascorbic acid.Amperometry was carried out to determine the concentration of AA at 0.2 V,and a good linear concentration range from 0.01 to 0.35 mmol/L was found.The sensitivity is 55.20 μA/（mmol·L-1） and the detection limit was 0.30 μmol/L（S/N=3）.

关 键 词：席夫碱铜配合物 修饰电极 抗坏血酸 电催化 

分 类 号：O657[理学—分析化学]