光学材料光学不均匀性绝对测量误差分析  

Error analysis of absolute test method of inhomogeneity of optical materials

作　　者：李强[1] 刘昂[1] 高波[1] 徐凯源[1] 柴立群[1] 

机构地区：[1]成都精密光学工程研究中心,四川成都610041

出　　处：《应用光学》2013年第3期463-468,共6页Journal of Applied Optics

基　　金：中国工程物理研究院资助项目(XX05010809)

摘　　要：绝对测量技术去除了干涉仪参考面面形误差,可实现光学材料光学不均匀性的高精度测量。对现有主要光学材料光学不均匀性绝对检测技术进行了总结比较,针对像素错位、干涉图分辨率、干涉仪测量重复性、样品厚度以及折射率测量等因素对光学不均匀性绝对检测的影响进行了实验分析。实验结果表明:干涉仪重复性是光学不均匀性测量的主要误差。样品翻转测量法、样品直接透射测量法、平行平板样品测量法3种测量方法均可实现光学不均匀性(RMS)10-8检测精度。Absolute test eliminates the surface that the inhomogeneity of optical materials can and comparison of several mainstream absolute errors of reference plane of interferometer, so be measured with high accuracy. A brief review test methods for inhomogeneity of optical mate- rial were given. And influence of the factors, such as the pixel offset, resolution of interfer- ence pattern, repetition of interferometer, the sample thickness and the refractive index meas- urement, etc, on the measurement error of absolute test was analyzed respectively. Experi- mental results indicate that the measuring accuracy of window-flipping method, transmission method and parallel flat method can reach 10-8 respectively. Repetition of interferometer is the main error in absolute test method of the inhomogeneity of optical materials.

关 键 词：测量 光学不均匀性 绝对检测 误差分析 

分 类 号：TN29[电子电信—物理电子学] O436.1[机械工程—光学工程]