A Comparative Study of Dynamic Sheath Analytical Models of a Multispecies Plasma Immersion Ion Implantation System in Collisionless Regime  

作　　者：Dushyant Gupta Jyotika Jogi P.J. George 

机构地区：[1]Electronics Department, University College, Kurukshetra University, Kurukshetra 136119, India [2]Department of Physics & Electronics, ARSD College, University of Delhi, Delhi, India [3]KITM, Kurukshetra University, Kurukshetra, India

出　　处：《材料科学与工程（中英文B版）》2013年第1期70-74,共5页Journal of Materials Science and Engineering B

关 键 词：等离子体浸没离子注入 离子注入系统 模型估计 物种 碰撞 护套 政权 脉冲电压 

分 类 号：TN305.3[电子电信—物理电子学] TG174.444[金属学及工艺—金属表面处理]