超导Nb膜的淀积及Nb/Al-AlO_X/Nb Josephson结的制备  

DEPOSITION OF SUPERCONDUCTING Nb FILMS AND PREPARATION OF Nb/AI-AlO_x/Nb JOSEPHSON JUNCTIONS

作　　者：徐剑虹[1] 蔡安江[1] 刘萍梅 汤延林[1] 刘新华 王吉云 宫海燕 张朝兴[1] 

机构地区：[1]合肥低温电子研究所

出　　处：《低温与超导》1991年第2期16-21,共6页Cryogenics and Superconductivity

摘　　要：使用低温泵真空系统的平面磁控溅射设备,通过严格控制溅射条件和溅射过程,成功地淀积了室温—液氮电阻比β优于2.2的超导Nb膜。沿用湿法刻蚀技术,制备了面积为4×4μm^2的Nb/Al-AlO_x/Nb Josephson结;并在本所自行研制的4.4K闭循环制冷机上观察到了较为理想的Josephson效应。Superconducting Nb Films with β>2.2 have been successfully deposited with planar magnetron sputtering technique using cryo-pump vaccum system by strictly controlling the sputtering parameters and procedure. With wet etching technique, Nb/Al-AlOx/Nb Josephson junctions in an area of 4×4μm2 have been prepared, and Josephson effect was observed with the aid of 4.4K closed cycle cryostat fabrication by our institue

关 键 词：超导膜 Nb膜 淀积 结 制备 半导体 

分 类 号：TM261.05[一般工业技术—材料科学与工程]