High-voltage super-junction lateral double-diffused metal-oxide semiconductor with a partial lightly doped pillar  被引量:3

High-voltage super-junction lateral double-diffused metal-oxide semiconductor with a partial lightly doped pillar

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作  者:伍伟 张波 方健 罗小蓉 李肇基 

机构地区:[1]State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China

出  处:《Chinese Physics B》2013年第6期633-636,共4页中国物理B(英文版)

基  金:supported by the National Science and Technology Major Project of the Ministry of Science and Technology of China (Grant No. 2010ZX02201);the National Natural Science Foundation of China (Grant No. 61176069);the National Defense Pre-Research of China (Grant No. 51308020304)

摘  要:A novel super-junction lateral double-diffused metal-oxide semiconductor (SJ-LDMOS) with a partial lightly doped P pillar (PD) is proposed. Firstly, the reduction in the partial P pillar charges ensures the charge balance and suppresses the substrate-assisted depletion effect. Secondly, the new electric field peak produced by the P/P junction modulates the surface electric field distribution. Both of these result in a high breakdown voltage (BV). In addition, due to the same conduction paths, the specific on-resistance (Ron,sp) of the PD SJ-LDMOS is approximately identical to the conventional SJ-LDMOS. Simulation results indicate that the average value of the surface lateral electric field of the PD SJ-LDMOS reaches 20 V/μm at a 15 μm drift length, resulting in a BV of 300 V.A novel super-junction lateral double-diffused metal-oxide semiconductor (SJ-LDMOS) with a partial lightly doped P pillar (PD) is proposed. Firstly, the reduction in the partial P pillar charges ensures the charge balance and suppresses the substrate-assisted depletion effect. Secondly, the new electric field peak produced by the P/P junction modulates the surface electric field distribution. Both of these result in a high breakdown voltage (BV). In addition, due to the same conduction paths, the specific on-resistance (Ron,sp) of the PD SJ-LDMOS is approximately identical to the conventional SJ-LDMOS. Simulation results indicate that the average value of the surface lateral electric field of the PD SJ-LDMOS reaches 20 V/μm at a 15 μm drift length, resulting in a BV of 300 V.

关 键 词:super-junction lateral double-diffused metal-oxide semiconductor partial lightly doped pillar electric field modulation breakdown voltage 

分 类 号:O471[理学—半导体物理]

 

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