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作 者:贺昊 赵地[1] 王鑫[1] 苏为宁[1] 江洪建[1]
出 处:《物理实验》2013年第6期40-43,共4页Physics Experimentation
基 金:国家基础科学人才培养基金资助项目(No.0204G088);江苏高校优势学科建设工程资助项目
摘 要:根据布儒斯特角原理对磁控溅射的铜膜样品进行了折射率的测量,实验发现当p偏振光以布儒斯特角入射时,反射光并没有完全消光.从理论上、通过数值计算分别论证了金属薄膜折射率的虚部、薄膜界面多次反射等因素的影响,并与实验结果比对得到符合的结果.The refractive index of Cu films prepared by magnetron sputtering was measured using Brewster angle method. Furthermore, an incomplete extinction phenomena had been discovered when P polarized light was incident on the sample at Brewster angle, which was different from that in insu lating films. To discuss this phenomenon, the effect of the imaginary part of the refractive index of metal film and the effect of multiple reflections theoretical analysis and numerical calculation. between film interfaces were assessed separately by
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