Ti6Al4V表面磁控溅射高硬SiC薄膜的摩擦磨损性能  

Friction/Wear Properties of Magnetron Sputtered High-hard SiC Films on Ti6Al4V Alloy

作　　者：潘应晖[1] 许晓静[2] 

机构地区：[1]武夷学院电子工程系,福建武夷山354300 [2]江苏大学先进成形技术研究所,江苏镇江212013

出　　处：《材料工程》2013年第6期63-66,共4页Journal of Materials Engineering

摘　　要：采用室温磁控溅射技术在Ti6Al4V表面制备出高硬SiC薄膜,对其组织结构、纳米压痕行为和摩擦磨损性能进行了研究。结果表明:实验制备的SiC薄膜呈非晶态,其纳米硬度、弹性模量分别为26.8GPa和229.4GPa;在以氮化硅球(半径为2mm)为对摩件的室温Kokubo人体模拟体液下,其磨损速率在10-5 mm3 m-1 N-1级,载荷低(50g)时摩擦因数约为0.173,载荷高(200g)时摩擦因数约为0.280,此时薄膜自身发生局部破裂。High-hard SiC film was developed on Ti6A14V alloy using magnetron sputtering technique at room temperature, and its microstructure, nanoindentation and friction/wear properties were investigated. The results show that the SiC films were amorphous and exhibited the nano-hardness of 26.8GPa and the elastic modulus of 229.4GPa. As sliding against Si3N4 ball （2mm in radius） using ball-on-disc type wear tester under Kokubo SBF at room temperature, the SiC films exhibited the special wear rate in the magnitude order of 10 -5 mm3 m-1 N-1 and the friction coefficient of about 0. 173 and 0. 280 at the load of 50g and 200g. The higher friction coefficient is primarily due to itself breakage of the SiC films.

关 键 词：钛基材 薄膜 纳米压痕 摩擦磨损 磁控溅射 

分 类 号：TG174.4[金属学及工艺—金属表面处理]