磁控溅射Ni_(56)Mn_(27)Ga_(17)合金薄膜的光学反射特性研究  

Research on optical reflective properties of Ni_(56)Mn_(27)Ga_(17) alloy thin films fabricated by magnetron sputtering

作　　者：周围[1] 刘超[1] 孙祺[1] 张坤[1] 牟海维[1] 

机构地区：[1]东北石油大学电子科学学院,黑龙江大庆163318

出　　处：《光学仪器》2013年第3期77-79,94,共4页Optical Instruments

基　　金：国家自然科学基金资助项目(51101027);黑龙江省新世纪优秀人才支持计划项目(1253-NCET-002);黑龙江省高校青年学术骨干支持项目(1251G004);黑龙江省教育厅科技项目(12511004)

摘　　要：Ni-Mn-Ga磁性形状记忆合金薄膜是非常有用的多功能材料,为考察其光学反射特性,采用磁控溅射技术在单晶硅衬底上沉积了Ni56Mn27Ga17合金薄膜,并对其表面形貌和光学反射特性进行研究。研究结果表明,薄膜的表面粗糙度随退火温度的升高而增大;在300～800nm波长范围内,薄膜反射率均随波长的减小而降低,且薄膜整体谱线范围内的反射率随退火温度的升高而降低。Ni-Mn-Ga magnetic shape memory alloy thin films are promising candidate of multi-functional materials. In order to explore its optical reflective properties, Ni56Mn27Ga17 thin film was deposited onto single silicon substrate by using magnetron sputtering technique. The surface morphology and optical reflective properties of the thin film were investigated with atomic force microscopy and spectrophotometer. The results showed that the surface roughness of the thin film increased with increasing annealing temperature, and the optical reflectivity of thin film decreased with decreasing wavelength in the range of wavelength between 300 and 800 nm. And the reflectivity of the thin film in the whole spectra range decreased with annealing temperature increase.

关 键 词：NiMnGa合金 薄膜 磁控溅射 光存储 

分 类 号：TG111.92[金属学及工艺—物理冶金]